GAGG (Ce) (Cerium-doped Gadolinium Aluminum Gallium Garnet) Crystal

GAGG (Ce) (Cerium-doped Gadolinium Aluminum Gallium Garnet) Crystal, with chemical formula Ce:Gd₃Al₂Ga₃O₁₂), is a new type of inorganic scintillation crystal with garnet structure. It has demonstrated outstanding performance among oxide scintillators.

Keywords:

Scintillation Crystals

Product Category:

  • Product Introduction
  • Key advantages
  • Application areas
  • Product Features
    • Commodity name: GAGG (Ce) (Cerium-doped Gadolinium Aluminum Gallium Garnet) Crystal

    GAGG (Ce) (Cerium-doped Gadolinium Aluminum Gallium Garnet) Crystal, with chemical formula Ce:Gd₃Al₂Ga₃O₁₂), is a new type of inorganic scintillation crystal with garnet structure. It has demonstrated outstanding performance among oxide scintillators.

    Product Introduction

    GAGG (Ce) (Cerium-doped Gadolinium Aluminum Gallium Garnet) Crystal, with chemical formula Ce:Gd₃Al₂Ga₃O₁₂), is a new type of inorganic scintillation crystal with garnet structure. It has demonstrated outstanding performance among oxide scintillators.

    The crystal's excellent energy resolution, high density, and characteristics such as no self-absorption and non-deliquescent make it particularly well-suited for applications in gamma spectroscopy, radiation detection, and medical imaging. Its fast decay time makes it suitable for PET imaging systems, while its low afterglow property enables its use in other imaging applications such as human body, industrial, non-destructive testing, security inspection, and X-CT.

     

    Key Advantages

    - High energy resolution 
    - Self-absorption
    - Non-deliquescent
    - Excellent time and spatial resolution‌
    - Low afterglow & high brightness
    - High light output

     

    Application Areas

    -Scanning electron microscopy (SEM)
    -Gamma-ray detection & medical imaging
    -Nuclear energy & high-energy physics
    -X-ray computed tomography (CT)
    -Positron emission tomography (PET)
    -Computed tomography (CT)
    -Particle accelerators

     

    Product Features

    Material Properties

    Crystal Structure

    Cubic

    Atomic Number

    54

    Density

    6.6 g/cm³

    Mohs Hardness

    8 Mohs

    Energy Resolution

    6%

    Deliquescence

    None

    Cleavage Plane

    None

    Decay Time

    90 ns

    Light Emission Wavelength

    530 nm

    Refractive Index

    1.9

    Afterglow

    0.01%

    Light Output

    46000 Photon/Mev

    Melting Point

    1850°C

    Product Processing Indicators

    Effective Aperture

    >90%

    Dimensions

    Customized to Customer Specifications

    Diameter Tolerance

    +0/-0.05 mm

    Length Tolerance

    ±0.2 mm

    Chamfer

    ≤0.2×45°

    Surface Quality

    10-5 S-D

    Flatness

    ≤λ/10@632.8 nm

    Parallelism

    <20"

    Perpendicularity

    ≤15′

    Chipped Edge

    <0.1 mm

    Coating

    Customized to Customers Specifications

  • - Luminescent properties
    - Radiation resistance
    - Short decay time
    - Fine energy resolution
    - Non-hygroscopic

  • - High-energy physics experiments
    - Nuclear Medicine
    - Environmental Monitoring
    - Space Science
    - Large Electron-Positron Collider
    - Dark Matter Detection

  • Material Properties
    Molecular formula Bi4Ge3O12
    Crystal structure Cubic crystal system
    Lattice constant a = 1.0518 Å
    Production method Tiraf Method
    Density 7.12g/cm3
    Mohs Hardness 5Mohs
    Radiation Length 1.1cm
    Transmittance range 350 nm ~ 5500 nm
    Relative Light Output (%) 10-14 Nal (Tl)
    Fluorescence spectrum peak 480–510 nm
    Recession time 300ns
    Energy resolution 20 (511 keV, %)
    Refractive index 2.098 @ 632.8 nm
    Melting point 1050°C
    Product Processing Metrics
    Directional <001> +/- 0.5°
    Effective Aperture >90%
    Dimensions Customized to customer specifications
    Diameter Tolerance +0 / -0.05 mm
    Length Tolerance ±0.2mm
    Protective Chamfer ≤0.2 × 45°
    Surface finish 10-5 S-D
    Flatness ≤λ/10 @ 632.8 nm
    Analyzing wavefront distortion ≤λ/8 @ 632.8 nm
    Parallelism <20"
    Verticality ≤15′
    Chipped edge < 0.1 mm
    Coating Customized to customer specifications

Online Quotation Request

Please provide your phone number and email address, and we’ll get in touch with you as soon as possible.

操作
Submit