Nd:YVO₄ (Neodymium-doped Yttrium Vanadate) Crystal

Nd:YVO₄ (Neodymium-doped Yttrium Vanadate) crystal is an outstandingly performing, commercially available laser crystal widely used in the fabrication of diode-pumped lasers, particularly for medium- and low-power applications.

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Scintillation Crystals

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  • Product Introduction
  • Key advantages
  • Application areas
  • Product Features
    • Commodity name: Nd:YVO₄ (Neodymium-doped Yttrium Vanadate) Crystal

    Nd:YVO₄ (Neodymium-doped Yttrium Vanadate) crystal is an outstandingly performing, commercially available laser crystal widely used in the fabrication of diode-pumped lasers, particularly for medium- and low-power applications.

    Product Introduction

    Nd:YVO₄ (Neodymium-doped Yttrium Vanadate) crystal is an outstandingly performing, commercially available laser crystal widely used in the fabrication of diode-pumped lasers, particularly for medium- and low-power applications. Compared to Nd:YAG, Nd:YVO₄ boasts a significantly higher absorption coefficient for pump light and a larger stimulated emission cross-section. When combined with nonlinear crystals such as LBO, BBO, and KTP, Nd:YVO₄ crystals enable highly efficient frequency-doubling conversions, making it possible to create solid-state lasers that emit in near-infrared, green, blue, and ultraviolet wavelengths. Today, Nd:YVO₄ lasers have found extensive applications across diverse fields, including machinery, material processing, spectroscopy, wafer inspection, optical display systems, medical diagnostics, laser printing, and data storage. Moreover, diode-pumped Nd:YVO₄ solid-state lasers are rapidly gaining traction in replacing traditional water-cooled ion lasers and lamp-pumped lasers—especially in scenarios demanding compact designs and single-longitudinal-mode outputs.

     

    Key Advantages

    - Low laser threshold and high slope efficiency 
    - Uniaxial birefringent crystal, with linearly polarized output 
    - High absorption gain cross-section 
    - Strongly polarized absorption and emission spectra (π-polarization performs better) 
    - The pull method yields high optical quality and large diameters.

     

    Application Areas

    - Optical communications
    - Holography 
    - Military sector 
    - Medical testing 
    - Laser printing 
    - High-repetition-rate Q-wwitched laser for marking and engraving 
    - Mode-locked laser for spectroscopic studies

     

    Product Features

    Material Properties

    Crystal Structure

    Tetragonal, Space Group D4h-I4/amd

    Lattice Constant

    a=b=7.1193 Å, c=6.2892 Å

    Density

    4.22 g/cm³

    Atomic Density

    1.26×10²⁰ atoms/cm³ (Nd 1.0%)

    Mohs Hardness

    4~5 Mohs (similar to glass)

    Thermal Expansion Coefficient (300K)

    αA=4.43×10-6/K

    αc=11.37×10-6/K

    Thermal Conductivity (300K)

    //C: 5.23 W/m/K

    ⊥C: 5.10 W/m/K

    Laser Wavelength

    1064 nm, 1342 nm

    Thermal-Optical Coefficient (300K)

    dno/dT=8.5×10-6 /K

    dN/dT=2.9×10-6 /K

    Stimulated Emission Cross Section

    25×10-19cm²@1064 nm

    Fluorescence Lifetime

    90 μs (1% Nd-doped)

    Absorption Coefficient

    31.4cm-1@810nm

    Intrinsic Loss

    0.02 cm-1@1064 nm

    Gain-Bandwidth

    0.96 nm@1064 nm

    Polarized Laser Radiation

    π-polarization; parallel to the optical axis (c-axis)

    Light-to-Electricity Conversion Efficiency

    >60%

    Sellmeier Equation (λ in µm)

    NO₂=3.77834+0.069736/(λ) ²-0.04724-0.010813λ²

    ne2=4.59905+0.110534/λ ²-0.04813-0.012676λ ²

    Product Processing Indicators

    End face

    Wedge-angle surface and double plane

    Effective Aperture

    >90%

    Orientation Tolerance

    (W±0.1 mm)×(H±0.1 mm)×(L+0.5/-0.1 mm) (L≥2.5 mm)

    (W±0.1 mm) × (H±0.1 mm)×(L+0.1/-0.1 mm) (L<2.5 mm)

    Chamfer

    ≤0.2×45°

    Surface Quality

    10-5 S-D

    Flatness

    ≤λ/8@632.8 nm

    Wavefront Distortion

    ≤λ/4@633 nm

    Parallelism

    <20"

    Perpendicularity

    ≤15′

    Angle Tolerance

    ≤0.5°

    Chipped Edge

    <0.1 mm

    Coating

    AR/HR/Metallic Film (Custom Solutions Available)

  • - Excellent thermal conductivity
    - Multiple possible pump wavelengths (typically 532 nm)
    - Broad-wavelength tunability
    - Broadly Absorbing Pump Band
    - Outstanding output efficiency
    - Short-lived excited state (3.2 μm)
    - Narrow mode-locking width
    - High damage threshold

  • - Mode-locked laser with ultrashort pulses
    - Multi-channel Amplifiers and Regenerative Amplifiers
    - The tunable wavelength range allows Ti:Sapphire lasers to replace dye lasers in many applications.
    - By using ultra-thin, non-critically phase-matched crystals like BBO as frequency-doubling devices, Ti:Sapphire lasers can generate ultrashort pulses as short as below 10 fs, producing light in the ultraviolet to deep-ultraviolet range—down to as low as 193 nm.
    -Ti:Sapphire is also widely used as a pump source for optical parametric oscillators to broaden their tuning range.

  • Basic Material Properties
    Molecular formula Ti³⁺:Al₂O₃
    Crystal structure Hexagonal crystal system
    Lattice constant a = 4.758 Å, c = 12.991 Å
    Density 3.98g/cm3
    Melting point 2040°C
    Mohs Hardness 9Mohs
    Thermal conductivity 52W/m/k
    Specific heat 0.42J/g/K
    Laser generation Four-level system
    Fluorescence lifetime 3.2 μs (T = 300 K)
    Tuning range 660-1050nm
    Absorption range 400-600nm
    Emission peak 795nm
    Absorption peak 488nm
    Refractive index 1.76 @ 800 nm
    Peak cross-section 3–4 × 10⁻¹⁹ cm²
    Coefficient of thermal expansion 8.40 × 10⁻⁶/°C

     

    Product Processing Metrics
    Directional The C-axis is the optical axis direction, which is perpendicular to the crystal surface.
    Ti2O3 concentration 0.06–0.26 at.%
    Quality factor 100–300 units
    Effective Aperture >90%
    Surface Dimension Tolerance 0 / -0.1 mm
    Thickness Tolerance ±0.1 mm
    Protective Chamfer ≤0.2 × 45°
    End face Double parallel planes or Brewster-cut ends
    Surface finish 10-5 S-D
    Flatness ≤λ/8 @ 633 nm
    Transmitted Wavefront Distortion ≤λ/4 @ 633 nm
    Parallelism 30"
    Verticality ≤15′
    Custom film system services available

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